Arrangement for projecting pattern on photo mask onto semiconductor wafer has supporting substrate surface with filter structure so more of perpendicularly incident light beam is reflected than of beam incident at inclination angle

摘要

The arrangement has a photo mask (10) and a transparent supporting substrate (16) arranged at a distance from the photo mask and essentially parallel to a first surface of the photo mask. A second surface (161) of the supporting substrate has a structure (17) for forming a filter so that a light beam (20) incident perpendicularly on the surface is reflected in a first proportion and a second light beam (22,24) incident at an inclination angle is reflected in a second smaller proportion. An independent claim is also included for a projection equipment for projecting a pattern on a photo mask, preferably onto a semiconductor wafer.