发明名称 POSITION DETECTOR AND PROJECTION ALIGNER AND EXPOSURE METHOD USING THE DETECTOR
摘要 PROBLEM TO BE SOLVED: To provide a position detector that can solve the problem caused by the conventional position detector for wafer etc., that, since the conventional detector always constantly detects a integrating region in a non-measuring direction with respect to alignment marks AM having different lengths in the non-measuring direction, alignment mark signals become low-contract signals and accuracy deterioration occurs. SOLUTION: The position detector can highly accurately detect the position of a wafer etc., by making the integrating region in the non-measuring direction variable with respect to alignment marks AM having different lengths in the non-measuring direction and setting an appropriate integrating region having the appropriate shortest length in the non-measuring direction with respect to alignment marks AM having short lengths in the non-measuring direction and set in accordance with the purpose of the user. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005166722(A) 申请公布日期 2005.06.23
申请号 JP20030399885 申请日期 2003.11.28
申请人 CANON INC 发明人 MISHIMA KAZUHIKO
分类号 G01B11/00;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G01B11/00
代理机构 代理人
主权项
地址