PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

Disclosed is a photoresist composition which contains (A) a polymer component comprising an alkali-soluble constitutional unit having an alicyclic group which has both (i) a fluorine atom or a fluorinated alkyl group and (ii) an alcoholic hydroxyl group, which polymer component has an alkali solubility that is changed by action of an acid, and (B) at least one sulfonium compound represented by at least the general formula (1) below as an acid generator which generates an acid when exposed to light. (In the formula, X represents an alkylene group having 2-6 carbon atoms wherein at least one hydrogen atom is substituted by a fluorine atom; and R<1>-R<3> independently represent an aryl group or an alkyl group while at least one of R<1>-R<3> represents an aryl group.)