| 摘要 |
PROBLEM TO BE SOLVED: To solve the following problem: a primarily normal chip is defocussed and exposed to cause to lower a yield in a reticle design composed of one shot unit of a plurality of chips. SOLUTION: An exposure system for transcriptionally exposing a pattern of an original plate by positioning the surface of a photosensitive substrate to an imaging surface after receiving a signal from a focus detecting mechanism comprises a function for determining a region to be exposed as a region with the occurrence of focus error when the region can not be focussed within the positioning accuracy, a function for obstructing the exposing beam or for stopping a beam emission command from the exposure source immediately after the occurrence of the focus error, a function for continuing a measurement of a surface position of the region even after the stopping of the exposure, and a function for transcriptionally exposing a pattern of the original plate to the region by the predetermined focus and a tilt position obtained by a result of the surface position measurement. COPYRIGHT: (C)2005,JPO&NCIPI
|
