发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To improve the LF property of a variable capacitance diode while suppressing the increase of its high frequency resistance Rs. SOLUTION: In this semiconductor device, a semiconductor layer of the first conductivity type is formed on the primary surface of a semiconductor substrate of the first conductivity type, and a semiconductor layer of the second conductivity type is formed with its lower surface contacting with the semiconductor layer of the first conductivity type, and with its upper surface exposed out of the primary surface of the semiconductor substrate. The surface size of the semiconductor layer of the first conductivity type is made to be smaller than the surface size of the semiconductor layer of the second conductivity type, so that the edges of the semiconductor layer of the first conductivity type is positioned inside the edges of the semiconductor layer of the second conductivity type. By using this design, the variable capacitance diode LF property is improved because the pn junction area is reduced, and the increase of the variable capacitance diode high-frequency resistance Rs is suppressed because it is only the n-type semiconductor layer that is reduced in area. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005166863(A) 申请公布日期 2005.06.23
申请号 JP20030402492 申请日期 2003.12.02
申请人 RENESAS TECHNOLOGY CORP 发明人 NOZAWA TOSHIYA;MITSUI MASAHITO
分类号 H01L29/93;(IPC1-7):H01L29/93 主分类号 H01L29/93
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