| 摘要 |
PROBLEM TO BE SOLVED: To uniformly etch an aluminum film or its alloy film without generating residue, unevenness or defect in the etching. SOLUTION: An aluminum film or its alloy film 11 or a stacked film of an upper layer composed of aluminum or the alloy thereof and a lower layer composed of a high melting point metal layer is etched with an etching solution comprising, by weight, 50.0 to 80.0% phosphoric acid, 0.5 to 10.0% nitric acid,≤10.0% acetic acid and 0.1 to 2.0% of at least either a fluorine based acid or a chlorine based acid, and water. COPYRIGHT: (C)2005,JPO&NCIPI
|
