CLEANING LIQUID COMPOSITION FOR MASK USED IN VACUUM DEPOSITION IN PRODUCTION OF LOW-MOLECULAR ORGANIC EL ELEMENT AND CLEANING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a cleaning liquid composition and a cleaning method capable of removing various organic materials attached to a mask in the vacuum deposition for the production of a low-molecular organic EL element with a single cleaning liquid. SOLUTION: The cleaning liquid composition for a mask used in the vacuum deposition for the production of a low-molecular organic EL element contains one or more kinds of aprotic polar solvents. COPYRIGHT: (C)2005,JPO&NCIPI