EXPOSURE TRANSFER MASK AND EXPOSURE TRANSFER MASK PATTERN EXCHANGE METHOD

摘要

An exposure transfer mask includes a mask section having a plurality of cells on each of which an opening of a predetermined pattern is formed. When a charged particle beam is applied to one side of the cells, the charged particle beam is transmitted to the other side of the cells according to the pattern of the opening formed on the cells. When a substrate to be processed is arranged at the other side of the cells, the opening pattern of the cells is transferred to the substrate to be processed so that an exposure pattern is formed on the substrate to be processed. In the aforementioned mask section, some or all of the plurality of cells can be exchanged.