发明名称 Semiconductor device and method of manufacturing the same, apparatus for manufacturing semiconductor device, circuit boa and electronic instrument
摘要 A method of manufacturing a semiconductor device comprising the steps of: preparing a flexible substrate which includes a base substrate having a light transmission property and an interconnecting pattern formed on one surface of the base substrate, the flexible substrate allowing a light to pass through a region other than the interconnecting pattern; recognizing a position of the interconnecting pattern by viewing the flexible substrate from a surface opposite to the surface on which the interconnecting pattern is formed through the base substrate; recognizing positions of electrodes formed on a semiconductor chip from a direction identical to that in recognizing the interconnecting pattern; and aligning the interconnecting pattern with the electrodes to connect the flexible substrate to the semiconductor chip by the face down bonding.
申请公布号 US6908776(B2) 申请公布日期 2005.06.21
申请号 US20020238771 申请日期 2002.09.11
申请人 SEIKO EPSON CORPORATION 发明人 HASHIMOTO NOBUAKI
分类号 H01L21/60;H01L23/498;(IPC1-7):H01L21/58;H01L21/68 主分类号 H01L21/60
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