| 摘要 |
A photo-patternable perfluorinated silane sol-gel material is presented that exhibits a high refractive index and propagation losses below 1 dB/cm at the telecommunication wavelengths. The sol-gels are produced with general formula [<?img id="CUSTOM-CHARACTER-00001" he="3.13mm" wi="2.79mm" file="US06908723-20050621-P00900.TIF" alt="custom character" img-content="character" img-format="tif" ?>(CH<SUB>2</SUB>)<SUB>n</SUB>,R'-Si(O)<SUB>2</SUB>]<SUB>x</SUB>-[Si(O)<SUB>4</SUB>]<SUB>y</SUB>-[R'-Si(O)<SUB>3</SUB>]<SUB>z</SUB>-[R''(CH<SUB>2</SUB>)<SUB>n</SUB>-M(O)<SUB>3</SUB>]<SUB>w</SUB>-[R'''(CH<SUB>2</SUB>)<SUB>n</SUB>-Si(O)<SUB>3</SUB>]<SUB>v </SUB>where O is oxygen, Si is silicon, M is a metal alkoxyde known to form bonds with organic compounds through oxygen donor ligands, and where <?img id="CUSTOM-CHARACTER-00002" he="3.13mm" wi="2.79mm" file="US06908723-20050621-P00900.TIF" alt="custom character" img-content="character" img-format="tif" ?>, R'' and R''' are photo cross-linkable groups, and where (CH<SUB>2</SUB>)<SUB>n </SUB>are alkyl spacers with n being an integer >=0. The sol-gels can be fabricated to produce complex waveguide structures directly onto silica-on-silicon substrates with low bending losses.
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