发明名称 METHOD FOR ELIMINATING PUNCTUAL DEFECTS COMPRISED IN AN ELECTROCHEMICAL DEVICE
摘要 <p>The invention concerns a method, using a laser radiation beam, for eliminating defects located within a laminated device consisting of at least one first substrate and at least one second substrate, said laminate incorporating between said first and second substrate at least one intelligent active system. Said method comprises a phase which consists in locating at least one defect located within the active system, a phase of ablation of the defect which consists in circumscribing same with said laser beam.</p>
申请公布号 KR20050060091(A) 申请公布日期 2005.06.21
申请号 KR20057005907 申请日期 2003.10.01
申请人 SAINT-GOBAIN GLASS FRANCE 发明人 BETEILLE FABIEN
分类号 B23K26/16;B32B17/10;C03B32/00;G02F1/15;G02F1/153;G02F1/17;H01L21/30;(IPC1-7):H01L21/30 主分类号 B23K26/16
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