发明名称 Zero-temperature-gradient zero-bias thermally stimulated current technique to characterize defects in semiconductors or insulators
摘要 A process for characterizing defects in semiconductors or insulators using a zero-bias thermally stimulated current technique wherein parasitic current is eliminated by the use of a novel ZBTSC apparatus that eliminates temperature gradient across a sample is described. The novel ZBTSC apparatus comprises a cold finger on a cyrostat. A sample holder is attached to the cold finger. A probe holder is attached to the cold finger. A probe is attached to the probe holder. A feedback temperature control keeps the probe and the cold finger at the same temperature. Alternatively, the sample holder may be attached to a first cold finger and the probe holder attached to a second cold finger. Feedback temperature controls for each cold finger are programed such that their temperatures are kept the same. The improved zero-bias thermally stimulated current technique of the invention comprises mounting a sample on the sample holder of the novel ZBTSC apparatus. The sample is excited at a first temperature to fill up defect traps with carriers and then heated to a second temperature higher than the first temperature wherein the heating is a linear function with respect to time. Defects are characterized by measuring current due to emission of the carriers from the defect traps as a function of temperature wherein the measuring is performed by the probe of the novel ZBTSC apparatus.
申请公布号 US6909273(B1) 申请公布日期 2005.06.21
申请号 US20000563833 申请日期 2000.05.05
申请人 CHARTERED SEMICONDUCTOR MANUFACTURING LTD. 发明人 LAU WAI SHING
分类号 G01R31/12;H01L21/00;(IPC1-7):G01R31/26;F25B19/00 主分类号 G01R31/12
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