METHODS OF FORMING A SMALL CONTACT STRUCTURE IN A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICES FABRICATED USING THE SAME,申请号KR20040056125-传众专利搜索

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发明名称	METHODS OF FORMING A SMALL CONTACT STRUCTURE IN A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICES FABRICATED USING THE SAME
摘要
申请公布号	KR20050059400(A)	申请公布日期	2005.06.20
申请号	KR20040056125	申请日期	2004.07.19
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	CHOI, SUK HUN;SON, YOON HO
分类号	H01L21/28;H01L21/20;H01L21/44;H01L27/24;H01L45/00;(IPC1-7):H01L21/28	主分类号	H01L21/28
代理机构		代理人
主权项
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