| 摘要 |
<P>PROBLEM TO BE SOLVED: To manufacture an integrated circuit wherein an electronic circuit including a ROM with specific proper information written in advance is integrated by using an exposure mask constituted of an optical switching element. <P>SOLUTION: The exposure mask is used for forming an exposure pattern which is different in each exposure by changing the light strength of transmitted light or reflection light to incident light. The exposure pattern is formed by an optical switching element composed of a first optical surface 2 and a second optical surface 6 disposed parallel perpendicular to an optical path. In the optical switching element, a displacement means displaces the second optical surface 6 by applying a force according to an electric signal applied from the outside to the second optical surface 6, and increases and decreases the length of the optical path. The integrated circuit is manufactured by using an exposure mask which changes the light strength of transmitted light or reflection light to incident light by using the change of an interference effect of light associated with the increase and decrease of the length of the optical path. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
