| 摘要 |
PROBLEM TO BE SOLVED: To accurately decide whether a defect has to be corrected, when a defect is detected in the case of inspecting a reticle related to a product. SOLUTION: Device patterns 43-1 to 43-4 are formed in an exposure region 42 of a reticle 41 for a product, and a program defect preliminarily evaluated about its defect transfer property is formed as an evaluation pattern, in an evaluation pattern region 44 different from the exposure region 42. When a defect is detected during inspecting a reticle for the product, the defect is compared with the evaluated program defect, to evaluate the transfer property of the defect. The detected defect is observed and compared with the evaluated program defect at the same inspection wavelength so as to accurately decide whether the defect will influence the transfer of the device pattern. COPYRIGHT: (C)2005,JPO&NCIPI |
