| 摘要 |
PROBLEM TO BE SOLVED: To provide a measurement method and a device for it capable of reducing a measurement error due to a light division means constituting an interference meter for measuring a wavefront of a detected optical system with higher precision than a conventional one and to provide an exposure method and a device for it using the above mentioned device and a device manufacturing method. SOLUTION: In this measurement method, luminous flux of measurement light is divided by using a light division means constructed by jointing a plurality of areas each having a pattern aligned in a predetermined direction, and when interference fringes obtained by interference of the measurement light passing through the detected optical system are measured, a wavefront aberration of the detected optical system is calculated. The measurement method comprises the steps for: measuring the interference fringes several times while shifting the light division means in the predetermined direction by a predetermined amount; averaging the results of the measurement carried out several times; and calculating the wavefront aberration of the detected optical system based on the averaged data. COPYRIGHT: (C)2005,JPO&NCIPI
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