发明名称 SUBSTRATE INSPECTING APPARATUS AND SUBSTRATE INSPECTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate inspecting apparatus and a substrate inspection method capable of reducing man-hours of reference data measurement for quality evaluation. SOLUTION: The apparatus comprises a transparent electrode 51 which captures electrons emitted from inspection points by the irradiation with laser light; an ammeter 53 which detects an electric current caused by the electrons captured by the electrode 51; a detection results storing section 85 which stores the presence or the absence of the electric current detected by the ammeter 53 for each inspection point; and a quality evaluating section 82 which makes all representative inspection points individually irradiated with a laser light, makes the detection results storing section 85 store the presence or the absence of the electric current detected by the ammeter 53, makes the inspection points other than the representative points irradiated with laser light, makes the detection results storing section 85 to store the presence or the absence of the electric current detected by the ammeter 53, and then evaluates the quality of a substrate 2, on the basis of the presence or the absence of an electrical signal for each inspection point including the representative points. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005156366(A) 申请公布日期 2005.06.16
申请号 JP20030395839 申请日期 2003.11.26
申请人 NIDEC-READ CORP 发明人 NUMATA KIYOSHI
分类号 G01R31/02;G01R31/302;H05K3/00;(IPC1-7):G01R31/302 主分类号 G01R31/02
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