发明名称 VACUUM TREATMENT DEVICE FOR FILM, AND VACUUM TREATMENT METHOD USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a vacuum treatment device for a film where a thin film is deposited on a sheet film or the sheet film is subjected to surface modification treatment, which is provided with a substrate fixing tool, and in which the upper face of the film is fully stuck to the fixing tool, and heating or cooling is possible in a uniform temperature distribution state, and to provide a vacuum treatment method using the same. SOLUTION: In the vacuum treatment system 1 for a film where the inside of a vacuum chamber 100 is provided with a substrate fixing tool 12 fixing a film 14 so as to be contacted with a substrate holder 10 at the lower side, and the lower part of the substrate holder 10 is provided with a vacuum treatment part 20 for performing vacuum treatment to the surface of the film, the lower side of the substrate fixing tool 12 has a semicylindrical curved surface, the substrate fixing tool 12 is made of an electrically conductive material, and a mechanism capable of heating or cooling is provided in the vicinity thereof. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005154875(A) 申请公布日期 2005.06.16
申请号 JP20030398786 申请日期 2003.11.28
申请人 TOPPAN PRINTING CO LTD 发明人 KOBAYASHI YUTAKA
分类号 C23C14/50;(IPC1-7):C23C14/50 主分类号 C23C14/50
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