发明名称 COPPER ELECTROLYTIC SOLUTION IN MANUFACTURING ELECTROLYTIC COPPER FOIL, AND METHOD FOR MANUFACTURING ELECTROLYTIC COPPER FOIL
摘要 PROBLEM TO BE SOLVED: To provide a copper electrolytic solution in manufacturing an electrolytic copper foil, which imparts a rough surface having the uniform shape and size of crests and small roughness to a deposited foil to be peeled off, without substantially lowering the yield of the deposited foil owing to difficulty of the control for the molecular weight and concentration of protein, and to provide a method for manufacturing the electrolytic copper foil with the use of the solution. SOLUTION: The copper electrolytic solution in manufacturing the electrolytic copper foil includes 2 to 4.5 ppm protein with a number average molecular weight M<SB>n</SB>of 1,000 to 2,300. The electrolytic solution preferably includes 60 to 100 g/l Cu<SP>2+</SP>, 60 to 250 g/l free SO<SB>4</SB><SP>2-</SP>, and 0.5 to 2.0 ppm Cl<SP>-</SP>. The method for manufacturing the electrolytic copper foil uses the above copper electrolytic solution. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005154815(A) 申请公布日期 2005.06.16
申请号 JP20030393134 申请日期 2003.11.21
申请人 MITSUI MINING & SMELTING CO LTD 发明人 SUGIMOTO AKIKO
分类号 C25D1/04;C25D3/38;C25D7/06;(IPC1-7):C25D3/38 主分类号 C25D1/04
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