| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing an ink-jet recording head in which a deviation in dimension and position of an opening of an ink supply port and reduction in yield are prevented simply. SOLUTION: Two or more stages of etching are applied for forming an ink supply port 28 on a Si substrate 10. For example, the Si substrate 10 is wet-etched up to a desired depth thereof ((d) in the Figure), and the remaining part of the Si substrate 10 is dry-etched to penetrate the same, forming the ink supply port 28 ((e) in the Figure). Further, when a sacrifice layer is provided according to the position where the ink supply port is formed, three or more stages of etching are applied. COPYRIGHT: (C)2005,JPO&NCIPI
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