| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treating device that can appropriately perform a half-exposing process and a chemical dissolving and reflowing process. SOLUTION: The substrate treating device is integrally provided with a substrate transporting mechanism 12 which transports a substrate, a chemical treatment unit 21 which performs chemical treatment on the substrate, and a gas atmosphere treatment unit 22 which performs gas atmosphere treatment on the substrate. Alternatively, the device is integrally provided with the substrate transporting mechanism 12 which transports the substrate, a temperature adjusting unit 19 which adjusts the temperature of the substrate, and the gas atmosphere treatment unit 22 which performs the gas atmosphere treatment on the substrate. COPYRIGHT: (C)2005,JPO&NCIPI
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