| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system for providing a beam of radiation on a flat article to be placed in a beam path of the beam of radiation, and an article handler for handling the article during placement or removal of the article. The article handler includes an electrode and a dielectric layer in order to form an electrostatic clamp for electrostatically clamping the article.
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| 申请公布号 |
US2005128459(A1) |
申请公布日期 |
2005.06.16 |
| 申请号 |
US20030734642 |
申请日期 |
2003.12.15 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
ZWET ERWIN V.;ELP JAN V.;MOORS JOHANNES HUBERTUS J.;NEERHOF HENDRIK A.J.;OTTENS JOOST J.;DE GROOF ADRIANUS MATHIJS M.;KUIPERS LEO WILHELMUS M.;GIESEN PETER THEODORUS M.;LE KLUSE MARCO |
| 分类号 |
G03F7/20;H01L21/00;H01L21/67;H02N13/00;(IPC1-7):G03B27/58 |
主分类号 |
G03F7/20 |
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