发明名称 |
Semiconductor device |
摘要 |
P-type buried regions 104 a and 104 b are formed in an extended drain region 102 formed in a P-type semiconductor substrate 110 . An N-type buried region 113 is formed between the P-type buried regions 104 a and 104 b. An N-type impurity concentration of the N-type buried region 113 along a G-G' plane is low in the vicinity of boundaries between the N-type buried region 113 and the P-type buried regions 104 a and 104 b and is increased from the boundaries to an inside of the N-type buried region 113.
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申请公布号 |
US2005127450(A1) |
申请公布日期 |
2005.06.16 |
申请号 |
US20040994358 |
申请日期 |
2004.11.23 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
TAKEHANA YASUHIRO;UNO TOSHIHIKO |
分类号 |
H01L29/78;H01L21/336;H01L29/06;H01L29/08;H01L29/10;H01L29/76;(IPC1-7):H01L29/76 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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