TANTALUM SPUTTERING TARGET AND METHOD FOR PREPARATION THEREOF

摘要

A tantalum spattering target which has a crystal structure wherein the (222) orientation is preferred toward the central face thereof from the position of 10 % of the thickness thereof; and a method for preparing the tantalum spattering target which comprises providing a tantalum ingot or billet formed by melting and casting, and subjecting the tantalum ingot or billet to forging and recrystallization annealing, followed by rolling, to form a crystal structure wherein the (222) orientation is preferred toward the central face of the ingot or billet from the position of 10 % of the thickness thereof. The spattering target allows the formation of a film exhibiting good uniformity and thus having improved quality.