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发明名称
Photoresistbeschichtungsverfahren und Vorrichtung zur Durchführung dieses Verfahrens
摘要
申请公布号
DE19818529(B4)
申请公布日期
2005.06.16
申请号
DE19981018529
申请日期
1998.04.24
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
KIM, MOON-WOO;YOUN, BYUNG-JOO
分类号
B05C11/08;B05D1/40;G03F7/16;H01L21/027;(IPC1-7):G03F7/16;B05B13/04
主分类号
B05C11/08
代理机构
代理人
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