| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask including a shadowing element, and to provide a method and system relating to the same. <P>SOLUTION: The photomask 311 for patterning an integrated circuit device 303 by using pattern irradiation 321 includes a transparent substrate 315, an irradiation blocking pattern 317, and an array 319a, 319b of shadowing elements. The transparent substrate 315 has first and second opposing surfaces, and the irradiation blocking pattern 317 is formed on at least one of the first and second surfaces of the transparent substrate 315. The irradiation blocking pattern 317 defines a pattern to be transferred onto the integrated circuit device 303. The array 319a, 319b of shadowing elements are disposed inside the transparent substrate 315 between the first and second surfaces. The shadowing elements of the array 319a, 319b have light transmitting characteristics different from those of an adjacent part of the transparent substrate 315. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
