发明名称 COMPONENT FOR VACUUM DEVICE, METHOD FOR MANUFACTURING THE SAME, AND DEVICE FOR USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To solve problems with components for a vacuum device used for a plasma apparatus and a film deposition apparatus of semi-conductor or the like that a product is stained by separation of a component itself during the use, separation of a film-like substance deposited on a component surface, and corrosion of the component surface by plasma, shortening of the lifetime of the component, and degradation of productivity by frequent replacement of the component. <P>SOLUTION: In the component for the vacuum device used for a film deposition apparatus and a plasma treatment device of semi-conductor or the like, the surface thereof is covered by ceramic and/or metal thermal-sprayed film, projection-shaped particles of the width of 10-300 &mu;m and the height of 4-600 &mu;m and the ratio (H/W) of the width (W) to the height (H) of &ge;0.4 are present in a density range of 20 pieces/mm<SP>2</SP>to &le;20,000 pieces/mm<SP>2</SP>on the surface of the thermal-sprayed film. The film-like substance of the porosity of 10-40% is high in adhesiveness, free from any stain of the product caused by dust attributable to separation of the film-like substance, and continuously usable for a long time. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005154896(A) 申请公布日期 2005.06.16
申请号 JP20040301858 申请日期 2004.10.15
申请人 TOSOH CORP 发明人 TAKAHASHI KOYATA;MATSUNAGA OSAMU;OKAMOTO MICHIO
分类号 C23C4/04;C23C4/08;C23C4/10;H01L21/3065 主分类号 C23C4/04
代理机构 代理人
主权项
地址