发明名称 METHOD OF MANUFACTURING ELECTRO-OPTICAL DEVICE, ELECTRO-OPTIC DEVICE, AND ELECTRONIC EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide an electro-optical device which has an active element, secures practical aperture ratio and is manufactured easily. <P>SOLUTION: A method of manufacturing the electro-optic device 100 is disclosed which comprises an element formation step of forming the active element 112 on one substrate 111; an insulation layer formation step of forming an insulation layer 113, provided with an aperture 113a reaching the conductive connection part 112e of the active element on one substrate formed with the active element; a ruggedness transfer step of transferring a rugged shape to the surface of the insulation layer by pressing a die to the insulation layer formed with the aperture; and an upper layer processing step of forming a reflection layer so as to obtain a scattering reflection surface reflecting the rugged shape on the insulation layer and also conductively connecting an electrode 115 constituted in the reflection layer or constituted separately from the reflection layer directly or indirectly with the active element via the aperture. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005157218(A) 申请公布日期 2005.06.16
申请号 JP20030399340 申请日期 2003.11.28
申请人 SEIKO EPSON CORP 发明人 KAMIJO KIMITAKA
分类号 G02F1/1335;G02F1/1343;G02F1/1368;G09F9/00;G09F9/30;H01L21/00;H01L21/48;H01L21/50;H01L27/12;H01L51/50;H05B33/10;H05B33/14;H05B33/22 主分类号 G02F1/1335
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