| 摘要 |
PROBLEM TO BE SOLVED: To provide an interferometer system improved in a lithograph system. SOLUTION: This interferometer system is provided with a beam production mechanism, a beam reflecting mirror, and a sensing device for detecting interference pattern of overlapped reflection beam. The beam production mechanism contains a beam splitter which partitions beam into a reference beam and a measuring beam, a reference mirror for providing a plane mirror interferometer, and a reflection surface which radiates at least one reference beam used for a differential plane mirror interferometer. COPYRIGHT: (C)2005,JPO&NCIPI |
