| 发明名称 |
Method for patterning films |
| 摘要 |
A process for patterning films comprises the steps of (a) vapor depositing resist material onto a film disposed on a substrate through a repositionable aperture mask, and (b) using a subtractive process to remove the exposed portion of the film.
|
| 申请公布号 |
US2005130422(A1) |
申请公布日期 |
2005.06.16 |
| 申请号 |
US20030734684 |
申请日期 |
2003.12.12 |
| 申请人 |
3M INNOVATIVE PROPERTIES COMPANY |
发明人 |
THEISS STEVEN D. |
| 分类号 |
C23C14/04;H01L21/027;H01L21/033;H01L21/308;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
C23C14/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
