发明名称 |
Methods, systems and computer program products for measuring critical dimensions of fine patterns using scanning electron microscope pictures and secondary electron signal profiles |
摘要 |
A pattern is inspected by acquiring a scanning electron microscope picture of an inspection pattern, and acquiring a scanning electron microscope secondary electron signal profile of the inspection pattern. A determination is made as to whether the inspection pattern is defective by comparing the scanning electron microscope picture of the inspection pattern to a scanning electron microscope picture of a sample pattern, and by comparing the scanning electron microscope secondary electron signal profile of the inspection pattern to a scanning electron microscope secondary electron signal profile of a sample pattern.
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申请公布号 |
US2005127292(A1) |
申请公布日期 |
2005.06.16 |
申请号 |
US20040008477 |
申请日期 |
2004.12.09 |
申请人 |
KANG MIN-SUB;LEE SANG-KIL;KIM KWANG-SIK;JUNG KYUNG-HO;KIM SUNG-JOONG |
发明人 |
KANG MIN-SUB;LEE SANG-KIL;KIM KWANG-SIK;JUNG KYUNG-HO;KIM SUNG-JOONG |
分类号 |
H01L21/66;G01Q10/04;H01J37/22;H01J37/28;H01L21/027;(IPC1-7):H01J37/28 |
主分类号 |
H01L21/66 |
代理机构 |
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地址 |
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