| 摘要 |
PROBLEM TO BE SOLVED: To provide a low-cost and efficient method which can modify and/or washing a part of the surface of a material selectively. SOLUTION: The selective surface modification/washing method comprises (1) a step to prepare a mask with a certain shield pattern on one side of a substrate having permeability to excimer UV light having a central wave length of 172 nm, (2) a step to prepare an subject to be treated, (3) a step to align the surface having the shield pattern of the mask onto the surface to be treated of the subject, and (4) a step to radiate excimer UV light from above the mask. COPYRIGHT: (C)2005,JPO&NCIPI
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