| 发明名称 |
Method for designing mask and fabricating panel |
| 摘要 |
A method for designing a mask and for fabricating a panel improves the efficiency with which a base substrate may be used by forming unit panels of different sizes on the base substrate. The mask includes a first region and a second region, a first mask pattern within the first region, and a second mask pattern within the second region.
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| 申请公布号 |
US2005128398(A1) |
申请公布日期 |
2005.06.16 |
| 申请号 |
US20050044301 |
申请日期 |
2005.01.28 |
| 申请人 |
KIM JEONG R.;KANG KYUNG K.;JEONG JO H.;NAM MYUNG W.;SHIN JAE D. |
发明人 |
KIM JEONG R.;KANG KYUNG K.;JEONG JO H.;NAM MYUNG W.;SHIN JAE D. |
| 分类号 |
G02F1/13;G02F1/1333;G02F1/1337;G02F1/136;G03F1/00;G03F9/00;H01L21/027;(IPC1-7):G02F1/133 |
主分类号 |
G02F1/13 |
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代理人 |
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