Extendable method for revising patterned microelectronic conductor layer layouts

摘要

Within both a method for revising a patterned conductor layer and a system for revising the patterned conductor layer there is provided within each wiring layout record within a series of wiring layout records within a wiring layout database directed towards a series of microelectronic fabrications an unoccupied equivalent wiring location within which may be formed at least one optional wiring pattern. When there is designed within an unoccupied equivalent wiring location for a single wiring layout record within the series of wiring layout records at least one optional wiring pattern and an interconnect option to the at least one optional wiring pattern.