发明名称 MASTER DISK EXPOSURE APPARATUS AND MASTER DISK EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a master disk exposure apparatus and master disk exposure method for manufacturing an optical information recording medium with high recording density at a low cost by shortening an exposure time per a sheet of master disk for information recording medium. <P>SOLUTION: The master disk exposure apparatus corrects fogging by using a plurality of semiconductor laser light sources of &le;390 nm in wavelength. An exposure waveform can be modulated in a &le;1 ns rise time, so that exposure to a bit pattern can be performed at a &ge;30 Mbps bit rate. Consequently, master disk exposure with recording density of &ge;15 Mbit/mm<SP>2</SP>is enabled. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005158243(A) 申请公布日期 2005.06.16
申请号 JP20040316158 申请日期 2004.10.29
申请人 HITACHI MAXELL LTD 发明人 SUGIYAMA TOSHINORI;KON ZEN;YOSHIOKA TERUFUMI
分类号 G11B7/0045;G11B7/125;G11B7/135;G11B7/26 主分类号 G11B7/0045
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