发明名称 METHOD OF PROCESSING INNER SURFACE OF HOLLOW WORK
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of processing uniformly the inner surface of a hollow work W. <P>SOLUTION: A work W is held in a vacuum chamber 11, a source gas introduced intermittently to the vacuum chamber 11 is ionized to generate plasma, and a bias voltage V is applied between an electrode 14 inside the work W and the work W, while causing the plasma to exist in the work W. The bias voltage V accelerates ions in the plasma toward the inner surface of the work W. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005158601(A) 申请公布日期 2005.06.16
申请号 JP20030397582 申请日期 2003.11.27
申请人 FUJITA GIKEN KK;ISHIKAWA PREF GOV 发明人 OKAZAKI KENICHI;AWAZU KAORU;YASUI HARUYUKI
分类号 H05H1/46;C23C16/509;C23C16/515;C23F4/00 主分类号 H05H1/46
代理机构 代理人
主权项
地址
您可能感兴趣的专利