发明名称 |
METHOD OF PROCESSING INNER SURFACE OF HOLLOW WORK |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of processing uniformly the inner surface of a hollow work W. <P>SOLUTION: A work W is held in a vacuum chamber 11, a source gas introduced intermittently to the vacuum chamber 11 is ionized to generate plasma, and a bias voltage V is applied between an electrode 14 inside the work W and the work W, while causing the plasma to exist in the work W. The bias voltage V accelerates ions in the plasma toward the inner surface of the work W. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005158601(A) |
申请公布日期 |
2005.06.16 |
申请号 |
JP20030397582 |
申请日期 |
2003.11.27 |
申请人 |
FUJITA GIKEN KK;ISHIKAWA PREF GOV |
发明人 |
OKAZAKI KENICHI;AWAZU KAORU;YASUI HARUYUKI |
分类号 |
H05H1/46;C23C16/509;C23C16/515;C23F4/00 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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