发明名称 ALIGNER AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To stably conduct an excellent exposure by keeping the polarized state of an exposure light reaching a photosensitive substrate approximately constant during an exposure even when the polarized state of a transmitted light is varied by the effect of a light transmitting member formed of a fluorite. SOLUTION: A mask (M) is illuminated on the basis of the exposure light from a light source (1), and a pattern on the mask is exposed on the photosensitive substrate (W). The polarized state of an incident light to the mask or the substrate is stabilized, and the pattern on the mask is exposed on the substrate. That is, the start of the exposure is stood by until the polarized state of the incident light to the mask or the substrate is stabilized after a time when the luminescence of the light source is started. When the mask or the substrate is exchanged, a light from the light source is interrupted at a specified place (10) without stopping the luminescence of the light from the light source. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005158784(A) 申请公布日期 2005.06.16
申请号 JP20030390673 申请日期 2003.11.20
申请人 NIKON CORP 发明人 NISHINAGA HISASHI;TANITSU OSAMU
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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