| 摘要 |
PROBLEM TO BE SOLVED: To realize suitable illumination conditions required for faithfully transferring a mask pattern having various characteristics, for instance, illumination conditions having a variety as to the light intensity distribution of a secondary light source, a polarization state and so on. SOLUTION: An illuminating optical device for illuminating a surface (M) to be irradiated is provided with illumination pupil forming means (3, 4, 7, 8) for forming illumination pupil distribution having light intensity distribution located in a center area including an optical axis (AX) and light intensity distribution located in a plurality of peripheral areas separated from the optical axis (AX), with intervals on the pupil surface of the illuminating optical device or its vicinity and area changing means (6: 6a, 6b) for changing the positions and the sizes of the light intensity distribution located in the plurality of peripheral areas, independently of the light intensity distribution located at the center area. COPYRIGHT: (C)2005,JPO&NCIPI
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