ELECTROSTATIC CHUCK, EXPOSURE APPARATUS, AND OBJECT CHUCKING METHOD

摘要

An electrostatic chuck (10) has a structure where independently drivable electrodes (12a, 12b) are provided in a dielectric ceramic body (11). The electrostatic chuck (10) is fixed at its side surface inside a semiconductor manufacturing apparatus, and the lower surface of the electrostatic chuck (10) chucks and holds an object. The lower surface of the dielectric ceramic body (11) for chucking and holding the object is concave. With this, when, for example, a plate-shaped glass mask is held, the warp of the glass mask is corrected to enhance the planarity of the glass mask.