发明名称 |
MAGNET ARRAY IN CONJUNCTION WITH ROTATING MAGNETRON FOR PLASMA SPUTTERING |
摘要 |
An array (60) of auxiliary magnets positioned along sidewalls (14) of a magnetron sputter reactor on a side towards the wafer from the target (16). The magnetron preferably is a small, strong one having a stronger outer pole (42) of a first magnetic polarity surrounding a weaker pole (40) of a second magnetic polarity and rotates about the central axis (38) of the chamber. The auxiliary magnets preferably have the first magnetic polarity to draw the unbalanced magnetic field component toward the wafer. The auxiliary magnets may be either permanent magnets (62) or electromagnets (90).
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申请公布号 |
KR20050058238(A) |
申请公布日期 |
2005.06.16 |
申请号 |
KR20047007291 |
申请日期 |
2002.11.07 |
申请人 |
APPLIED MATERIALS INC. |
发明人 |
DING PEIJUN;TAO RONG;XU ZHENG |
分类号 |
H05H1/46;C23C14/04;C23C14/34;C23C14/35;H01J37/32;H01J37/34;H01L21/285;H01L21/768;(IPC1-7):H01J37/34 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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