发明名称 COMPOSITE MATERIAL AND ITS MANUFACTURING METHOD, AND WAFER HOLDING MEMBER
摘要 PROBLEM TO BE SOLVED: To solve the problem that, in the case where a plate composed of an Al-SiC two-component composite material or a plate composed of an Al-Si-SiC composite material is used, vacuum airtightness of 1.3×10<SP>-10</SP>Pa×m<SP>3</SP>/sec He leak rate needed in the inside of semiconductor manufacturing equipment cannot be maintained even if the above composite-material plate is joined to a plate-like base material with a brazing filler metal, a solder, etc., because the composite-material plate itself is porous. SOLUTION: The composite material comprises SiC, SiO<SB>2</SB>and at least either of Al and Si and has≤1.3×10<SP>-10</SP>Pa×m<SP>3</SP>/sec He leak rate. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005154832(A) 申请公布日期 2005.06.16
申请号 JP20030394817 申请日期 2003.11.25
申请人 KYOCERA CORP 发明人 ITONAGA NAOKO
分类号 C04B37/00;C22C21/00;C22C29/02;C23C14/50;C23C16/458;H01L21/205;H01L21/3065;H01L21/68;H01L21/683;(IPC1-7):C22C29/02;H01L21/306 主分类号 C04B37/00
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