Wavelength selecting method, position detecting method and apparatus, exposure method and apparatus, and device manufacturing method

摘要

A wavelength selecting method for selecting a wavelength of light, the light being used to detect a position of a target with a signal from an image of an alignment mark covered with resist, includes the steps of obtaining a reflectance of the resist at a position outside the alignment mark by irradiating lights having plural wavelengths to the resist at the position, and selecting one of the lights which one has a wavelength that provides the maximum value of<img id="custom-character-00001" he="2.46mm" wi="2.12mm" file="US20050128452A1-20050616-P00900.TIF" alt="custom character" img-content="character" img-format="tif"/> reflectance among the reflectances measured by the measuring step or which one has a wavelength that falls within a predetermined wavelength range centering on the wavelength that provides the maximum reflectance.