| 发明名称 |
Positive photosensitive composition |
| 摘要 |
A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
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| 申请公布号 |
US2005130060(A1) |
申请公布日期 |
2005.06.16 |
| 申请号 |
US20040866054 |
申请日期 |
2004.06.14 |
| 申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KODAMA KUNIHIKO;AOAI TOSHIAKI |
| 分类号 |
C07C309/06;C07C381/12;G03F7/004;G03F7/039;(IPC1-7):G03C1/76 |
主分类号 |
C07C309/06 |
| 代理机构 |
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