发明名称 Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants
摘要 A method for manufacturing an article having polymeric residue that is to be removed during the manufacture of the article is disclosed. The article is introduced into a controlled environment of a processing tool having one or more processing chambers. Free radicals are generated from one or more reactant gases and introduced into at least one of the one or more processing chambers where they react with the polymeric residue. A cryogenic cleaning medium is supplied into at least one of the one or more processing chambers where it removes the polymeric residue present after the free radicals react with the polymeric residue. The reactant gases are selected to facilitate removal of the polymeric residue with the cryogenic cleaning medium The cryogenic cleaning medium is supplied via a nozzle implement that sweeps across the article. A slide mechanism and drive motor may be supplied internal or external to the controlled environment.
申请公布号 US2005127038(A1) 申请公布日期 2005.06.16
申请号 US20050045685 申请日期 2005.01.28
申请人 TANNOUS ADEL G.;MAKHAMREH KHALID 发明人 TANNOUS ADEL G.;MAKHAMREH KHALID
分类号 B08B5/02;B08B7/00;B24C1/00;H01L21/00;(IPC1-7):C23F1/00 主分类号 B08B5/02
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