发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To accurately and smoothly implement the inspection process of a semiconductor device. <P>SOLUTION: The manufacturing method of a semiconductor device includes a step of performing a packaging process of forming at least a resin layer, a wiring layer passing above the resin layer; and an external terminal electrically connected to the wiring layer on the resin layer on the first region 40 of a semiconductor substrate 10 having the first region 40 composed of a plurality of semiconductor chip regions 20 on which an integrated circuit including a pad is formed, and having a second region 42 around the first region 40. At least a partial process of the packaging process is implemented for the second region 42. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005159004(A) 申请公布日期 2005.06.16
申请号 JP20030395356 申请日期 2003.11.26
申请人 SEIKO EPSON CORP 发明人 SHIBAZAKI MASAO
分类号 H01L21/66;H01L21/3205;H01L21/56;H01L23/12;H01L23/52;(IPC1-7):H01L21/66;H01L21/320 主分类号 H01L21/66
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