| 摘要 |
PROBLEM TO BE SOLVED: To provide a glass film manufacturing method for forming a glass film having the same composition and the same thickness on upper and lower sides of a substrate. SOLUTION: In the glass film manufacturing method in which an upper electrode 18 and a lower electrode 16 are arranged in a reaction vessel 11 facing each other, high voltage is applied to the electrodes 16 and 18, the electrodes 16 and 18 are heated, gas to form raw glass is introduced into the vessel 11, and a glass thin film is formed on a substrate 25 in the plasma atmosphere, the substrate is arranged on the lower electrode 16 via a gap, an open space 26 is formed on a lower side of the substrate 25 and a glass film is deposited on both sides of the substrate 25. COPYRIGHT: (C)2005,JPO&NCIPI |
