| 摘要 |
PROBLEM TO BE SOLVED: To measure optical performance of an optical system to be inspected of a projection optical system or the like with high precision without being affected by transmission distribution of an optical system for instrumentation. SOLUTION: At the time of exposure under basis of exposure light IL from a lighting optical system 12, the pattern of a reticle R is transferred on a wafer W through a projection optical system PL. At the time of instrumentation of numerical aperture of the projection optical system PL, the instrumentation equipment 21 is arranged so that the projection optical system PL may be countered. The exposure light IL which passes the projection optical system PL is received by a two-dimensional imaging element 24 through a pin hole board 22 and a collimator lens 23 in the instrumentation equipment 21. Light volume distribution measured with two-dimensional imaging element 24 is corrected with the transmission distribution of the pin hole board 22 and the collimator lens 23 which is obtained beforehand. COPYRIGHT: (C)2005,JPO&NCIPI
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