发明名称 |
Antenna for plasma processor apparatus |
摘要 |
An antenna includes excitation terminals responsive to an RF source to supply an RF electromagnetic field to a plasma that processes a workpiece in a vacuum chamber. The coil includes a transformer having a primary winding coupled to the excitation terminals and a multi-turn plasma excitation secondary winding connected in series with a capacitor.
|
申请公布号 |
US2005128160(A1) |
申请公布日期 |
2005.06.16 |
申请号 |
US20050044269 |
申请日期 |
2005.01.28 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
HOWALD ARTHUR M.;KUTHI ANDRAS |
分类号 |
H01J37/32;(IPC1-7):H01J7/24 |
主分类号 |
H01J37/32 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|