发明名称 Method and systems for improving focus accuracy in a lithography system
摘要 A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.
申请公布号 US2005128456(A1) 申请公布日期 2005.06.16
申请号 US20050050694 申请日期 2005.02.07
申请人 发明人 NELSON MICHAEL L.;KREUZER JUSTIN L.;FILOSI PETER L.;MASON CHRISTOPHER J.
分类号 G01B21/00;G03F7/20;G03F7/207;G03F9/00;G03F9/02;H01L21/027;(IPC1-7):G03B27/52 主分类号 G01B21/00
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