| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate for electrooptical device which can prevent an increase in contact resistance in a thin-film transistor and an increase in variation therein, and to provide a method of manufacturing the substrate for electrooptical device, an electrooptical device, and electronic equipment. SOLUTION: The substrate 10 for electrooptical device is formed by sticking a supporting substrate 10A with a semiconductor substrate having a semiconductor layer 1a, wherein a thin-film transistor 30A using the semiconductor layer 1a as an active layer is formed. In this substrate 10, relay layers 3b, 3c having conductivity are formed on a source region 1d and a drain region 1e of the thin-film transistor 30A. COPYRIGHT: (C)2005,JPO&NCIPI |
